Grad Profiles - Arizona State University Chemical Engineering

Overview
The first bachelor's degree program in engineering was approved in 1956, largely through the efforts of valley civic and industry leaders who lobbied Arizona legislators. Today, there are approximately 180 tenure and tenure-track faculty members in seven prominent engineering departments with the School of Engineering and the Del E. Webb School of Construction, which is one of the premier construction programs in the country. The College also supports six prestigious research centers, many of which are cooperative efforts between CEAS and other Arizona State University entities, other universities or research laboratories, and industry partners.

There are more than 44,000 students at Arizona State, including more than 10,000 students pursuing a graduate degree program. More than 1,600 of the 6,008 students in the College of Engineering and Applied Sciences are pursuing graduate degrees. There are 401 students enrolled in doctoral programs within the College.

The Community
Arizona is well known for its scenic attractions that range from desert to mountain woodlands, lakes, and streams. The metropolitan community immediately surrounding Arizona State University thrives on high-technology industries that have large research and development staffs involved with computers airborne electronics, semiconductors, turbines, energy production and conservation, food processing, and health services.

Programs of study and degree requirements
The Chemical Engineering Program at Arizona State University (ASU) is in the Department of Chemical and Materials Engineering and offers graduate programs that lead to the Master of Science, Master of Science in Engineering, and Doctor of Philosophy degrees in chemical engineering. The faculty offers a wide range of course work and research topics, allowing the student an opportunity to develop a program of study to satisfy his or her specific needs. Research is currently being done in the areas of biotechnology, air and water purification, semiconductor materials processing, surface science, control system engineering, environmental remediation, environmentally benign manufacturing, and air pollution modeling. With their choice of electives and thesis research topics, students are encouraged to take advantage of the synergy that exists between the two degree-granting programs in the department and between the departments within the College of Engineering and Applied Sciences.

The Master of Science degree program requires a minimum of 33 credit hours, including 6–9 hours of thesis credit.

The Doctor of Philosophy degree program requires a minimum of 84 hours beyond the bachelor's degree. To satisfy the residency requirements, the students must spend a minimum of two semesters of full-time study on campus. All candidates must take written and oral qualifying exams during their first semester in the program. The exam consists of the preparation of a research proposal on a topic selected by the student from a list provided by the faculty. Students are admitted to candidacy after passing a comprehensive exam, which is given near the completion of course work. The exam consists of an oral and written dissertation prospectus.

Students with a B.S. degree in a field other than chemical engineering are encouraged to apply. The Graduate Committee determines, on an individual basis, which undergraduate courses must be taken to ensure success in the graduate program. These courses are not counted toward the program of study.

Facilities & Resources
Research facilities within the department are supplemented by the laboratories in the Center for Solid State Electronics Research, the Environmental Fluid Dynamics Program, the Computer-Integrated Manufacturing Systems Research Center, and the Center for Energy Systems Research, all of which provide technical support for students and faculty in the chemical engineering program.

Engineering Technical Services has a staff of 35 full-time computer specialists who support the wide array of computers and electronic equipment within the college. The college also maintains complete machine, carpentry, electrical, and paint shops to support graduate research.

The University libraries house more than 2 million volumes, 1.7 million microfilms, and 24,000 journal titles. The Noble Science and Engineering Library, a designated patent depository, houses the entire U.S. patent collection.

Expenses and Aid
Costs: Tuition for 7 hours or more is $2200 per semester for Arizona residents. Nonresidents paid $798 per credit hour. The Graduate College considers 9 credit hours full-time enrollment.

Financial Aid: Graduate teaching or research assistantships are available, including sponsored research support. Students should write to the Associate Dean for Academic Affairs for further information. Convenient arrangements are made for the numerous graduate students who are employed full-time in local industries.

How to Apply
All students must apply for admission through the Graduate College. For application forms, students should contact Graduate Admissions, Arizona State University, Tempe, Arizona 85287-1003 or call 480-965-6113. Submission of Graduate Record Examinations (GRE) scores and a statement of purpose is required. International students whose native language is not English must submit a Test of English as a Foreign Language (TOEFL) score of 580 or better. Applications are reviewed continuously but, for financial consideration, should be received by February 1 for the following academic year.

Who to Contact
Chair of Graduate Committee
Chemical and Materials Engineering
Arizona State University
Tempe, Arizona 85287-6006
Telephone: 480-965-3313
E-mail: cmerec@asu.edu
http://www.eas.asu.edu/~~~~?MDSU?~cme/

THE FACULTY AND THEIR RESEARCH

Chemical Engineering
Jonathan O. Allen, Ph.D., MIT. Atmospheric aerosol chemistry, single particle measurement techniques, environmental fate of organic pollutants.
Stephen P. Beaudoin, Ph.D., North Carolina State. Semiconductor materials processing and environmentally-benign manufacturing, transport phenomena, surface science, particle and thin film adhesion, chemical-mechanical polishing, polymer dielectric processing.
James R. Beckman, Ph.D., Arizona. Unit operations, applied mathematics, energy-efficient water purification, fractionation, CMP reclamation.
Veronica A. Burrows, Ph.D., Princeton. Surface science, environmental sensors, semiconductor processing, interfacial chemical and physical processes in sensor processing.
Ann M. Dillner, Ph.D., Illinois at Urbana-Champaign. Atmospheric particulate matter (aerosols) chemistry and physics, ultrafine aerosols, light scattering and climate effects of aerosols, health effects of aerosols.
Gregory B. Raupp, Ph.D., Wisconsin. Gas-solid surface reaction mechanisms and kinetics, interaction between surface reactions and simultaneous transport processes, semiconductor materials processing, thermal and plasma-enhanced chemical vapor deposition (CVD), environmental pollution remediation and control, photocatalytic oxidation.
Anneta P. Razatos, Ph.D., Texas at Austin. Bacterial adhesion, colloid interactions, AFM, biofilms, genetic engineering.
Daniel E. Rivera, Ph.D., Caltech. Control systems engineering, dynamic modeling via system identification, robust control, computer-aided control system design.
Michael R. Sierks, Ph.D., Iowa State. Protein engineering, biomedical engineering, enzyme kinetics, antibody engineering.

Materials Science Engineering
James Adams, Ph.D., Wisconsin. Atomistic simulation of metallic surfaces, grain boundaries, catalysts, polymer-metal adhesion.
Terry L. Alford, Ph.D., Cornell. Microelectronic metallization and reliability, silicide formation, ion-beam modification of materials.
Nikhilesh Chawla, Ph.D., Michigan. Mechanical behavior of materials, metal and ceramic composites, nanocomposites, Pb-free solders, aluminum alloys, powder metallurgy, biomaterials.
Sandwip K. Dey, Ph.D., Alfred, College of Ceramics. Thin-film processing science of electroceramics; characterization of electrical, microstructural, and microchemical properties; high-permittivity dielectrics for USLI DRAMs and microelectronic packages.
Lester E. Hendrickson (Emeritus), Ph.D., Illinois. Corrosion, fracture and failure analysis, physical and chemical metallurgy.
Stephen L. Krause, Ph.D., Michigan. Ordered polymers, composite materials, electronic materials, X-ray diffraction, electron X-ray diffraction, electron microscopy.
James W. Mayer, Ph.D., Purdue. Electronic materials and metallization of integrated circuits; development of new semiconductor materials, such as the ternary alloy SiGeC grown on silicon; development of new metal systems for interconnectors; interdiffusion and reactions in thin films; analysis of paint pigments, art media, and metallic artifacts; ion-beam analysis and Rutherford backscattering analysis.
Nate Newman, Ph.D., Stanford. Growth, characterization, and modeling of solid-state materials.
S. Tom Picraux, Ph.D., Caltech. Nanostructured materials, epitaxy, thin-film electronic materials.

Chemical and Materials Engineering Faculty Affiliates
Michael Kozicki, Ph.D., Edinburgh; Department of Electrical Engineering. Integrated circuit processing, nanotechnology, low-power nonvolatile memories, integrated field emission devices, bio-hybrid systems, microelectronics manufacturing and contamination control.
William Petuskey, Sc.D., MIT; Department of Chemistry and Biochemistry. Physical chemistry of ferroelectric relaxors, layered structure compounds as soft ceramics, synthesis and properties of Group IV nitrides, high-temperature oxide liquids: glasses and solification microstructures.
Dieter Schroder, Ph.D., Illinois; Department of Electrical Engineering. Characterization of semiconductors and devices.
David Smith, Ph.D., Melbourne; Regents' Professor, Department of Physics and Astronomy and Center for Solid State Science. Atomic-resolution electron microscopy, instrumentation and image processing, applications to semiconductor heterostructures, magnetic materials, and nanostructured materials.
Ignatius S. Tsong, Ph.D., London, D.Sc., Leeds; Department of Physics. Growth of semiconductors and surface physics.